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| ♦Surface
reforming system |
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| DLC
thin film depositing system |
| This system uses the plasma
CVD method to form a diamond-like carbon (DLC) thin film, excellent
in corrosion resistance, wear resistance and smoothness, onto different
types of substrates. Using a hot cathode PIG plasma gun as the plasma
source, it can activate the gas in a vacuum atmosphere, causing reaction
to create a high-quality thin DLC film. |
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| Model : AAPIG-16110D |
[Features]
This model can form a SiO2 film of 15μm thickness by means of a proper
electrode gap, uniform supply of reaction gas, adequate discharge
electrodes and heating treatment. It is most suitable for the production
system of electronic parts. |
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| Model : APIG-1060D |
[Features]
This machine, a test model for semi-automatic DLC thin film depositing
system, uses a hot cathode PIG plasma gun as the plasma source. Although
it is compact, the model has the same performance as mass production
machines. |
| Ion
plating system |
The SHINKO SEIKI's ion plating
systems are now efficiently used not only by Japanese users but also
by worldwide users, and their system performance is highly appreciated
by those users.
Track record reveals that the systems have been supplied to customers
in the field of new materials development, and they are also marketed
as volume production machines. This leading-edge thin film system
will be surely effective for users working in diversified areas of
research and development.
The high-vacuum ion plating system of arc discharge type allows processing
in a high-vacuum atmosphere because it requires no discharge gas.
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| Model : AIH-16110 |
[Features]
This model is a horizontal rotation & revolution ion plating system
for semi-automatic quantity production. Machines are highly appreciated
in the ornamentation, tools and other related fields.
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| Model : AIF-850SBT |
[Features]
This model is a hypercomplex ion plating system developed for applications
in alloy film deposition in addition to superconducting film, which
requires simultaneous evaporation of different two or more substances.
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