ICP plasma etching unit, SERIO
SERIO is a plasma etching unit with a high-density ICP plasma source.
Designed for an internally developed process, it delivers high verticality and smoothly etched surfaces.
SERIO offers the optimum system configuration for high-aspect etching processes needed in the electronics, MEMS and nano-imprinting fields.
Now accepting sample demonstration requests.
ICP plasma etching unit, SERIO [Features]
SERIO is a high-density plasma etching unit that renders smoothly etched surfaces by using a high-density ICP plasma source.
It features excellent etching angle controllability that lends itself well to fabricating nano-imprint molds.
