Products

ICP plasma etching unit, SERIO

SERIO is a plasma etching unit with a high-density ICP plasma source.
Designed for an internally developed process, it delivers high verticality and smoothly etched surfaces.
SERIO offers the optimum system configuration for high-aspect etching processes needed in the electronics, MEMS and nano-imprinting fields.

Now accepting sample demonstration requests.

ICP plasma etching unit, SERIO ICP plasma etching unit, SERIO

[Features]

SERIO is a high-density plasma etching unit that renders smoothly etched surfaces by using a high-density ICP plasma source.
It features excellent etching angle controllability that lends itself well to fabricating nano-imprint molds.

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