SHINKO SEIKI'S HIGH QUALITY THIN FILM DEPOSITION TECHNOLOGY

With the background of rich experiences acquired as a specialist of vacuum technology, SHINKO SEIKI has so far developed its own thin film deposition equipment such as sputtering, vacuum evaporation, ion-plating, and CVD incorporating with them its own unique technology and know-how.

Batch-Type Sputtering Equipment

This is a parallel plate type equipment developed and designed for use both in the laboratory and in the production line. The equipment has an excellent film deposition performance and at the same time, it is designed paying the utmost attention to the cost effectiveness. It also has various optional functions to comply with its application and film deposition quantity.

Batch-Type Sputtering Equipment

Multi-Chamber Sputtering Equipment [PRODUCE]

This multi-chamber sputtering equipment, PRODUCE, made it possible for use even in the laboratory for its excellent cost performance. It also has various optional functions as stated below:

  • Bias sputtering mechanism
  • High temperature sputtering
  • Collimate sputtering
  • Long throw sputtering
  • For thin film magnetic head
  • Ferromagnetic cathode, Wide errosion cathode
  • Magnetic field film deposition mechanism
  • Ion milling system
 Produce

 

Vacuum Evaporation Equipment
Our typical models are box-type high-vacuum evaporation equipment employing the front-door system. As regards the composition of the inner mechanism and evaporation source, selection is possible from various patterns and methods. Vacuum Evaporation Equipment
 
Ion-Plating Equipment

Our arc-discharge type high vacuum ion-plating equipment has a unique ionization technology. The principle of our ionization mechanism is utilization of the evaporation pressure and the thermo-electron emission from the evaporation material.

 Ion-Plating Equipment
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