Company history
Foundation-1969
| Capital / Business milestones | Technologies / Products milestones | |
|---|---|---|
| Began doing business by renting the Karumo Factory of Kawanishi Kikai Seisakusho. Capital: 200,000 yen.  |
1949 | Manufacturing of combing machines, electric equipment and talkie projectors  |
| 1950 | Start of manufacturing of infrared drying furnaces, various conveyors and coating equipment. | |
| 1951 | Start of manufacturing of vacuum pumps and vacuum equipment
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| Capital was increased to 800,000 yen. | 1953 |  |
| Capital was increased to 3,200,000 yen. | 1954 | |
| 1956 | Start of manufacturing of precision projectors. |
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| 1957 | We succeeded in domestically producing a large-sized vacuum mechanical booster pump (Exhaust rate: 22,000 m3/h), SMB-20000, using industrial subsidies from the Ministry of International Trade and Industry. |
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| Capital was increased to 9,600,000 yen. | 1958 | Start of manufacturing of semiconductor-related equipment Delivery of vacuum degassing ingot casting equipment Completion of reduction furnace, refining furnace, monocrystalline furnace and alloy furnace for Ge |
| Tokyo Office was newly established in Ginza. | 1959 | |
| Capital was increased to 20,000,000 yen. | 1960 | Production of wool combing machines (Comber) exceeded 1000 units. Completion of monocrystalline furnace for Si |
| Capital was increased to 50,000,000 yen. | 1962 | We succeeded in commercializing high-vacuum deposition equipment of a high vacuum rate. |
| Tokyo Office was raised to Tokyo Branch (relocated to Nihonbashi, Chuo-ku). Capital was increased to 100,000,000 yen. |
1963 | Completion of large-sized precision projector, SG30 |
| 1965 | Development and commercialization of ultra-high-vacuum multi-layer film deposition equipment using electron beams, ion bombardment equipment and automatic solder bath equipment | |
| Tokyo Factory was newly established in Ota-ku, Tokyo. | 1966 | Launch of multi-stage diffusion furnace |
| 1967 | Production of combing machines (Comber) exceeded 2000 units. Completion of IC firing furnace. Completion of vacuum sintering furnace.  |
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Shiga Moriyama Factory was newly established Moriyama, Shiga. |
1968 | |
| 1969 | Completion of new coating system and powder coating equipment |
1970-1990
| Capital / Business milestones | Technologies / Products milestones | |
|---|---|---|
| Completion of the second phase of construction work at the Moriyama Factory in Shiga | 1970 | Commercialization of electronic automatic card punching equipment, ACP-900-3S, through joint development with HAYASHIMON KOSHO |
| Capital was increased to 200,000,000 yen. | 1971 | Completion of large-sized precision projector, HG-40, with the largest screen size among domestic projectors Completion of multi-purpose small-sized conveyor furnace |
| 1972 | Production of bowling projectors exceeded 10,000 units. |
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| 1973 | Completion of standardization of deposition equipment for quartz oscillators | |
| Sales Dept. was transferred to Goko-Dori (Goko Bldg.) in Chuo-ku, Kobe. | 1975 | Completion of vacuum press-fitting machine for quartz oscillators Launch of oil rotary vacuum pump, SRP-15000B Completion of standardization of solder reflow furnace for thick film IC PCB mounting process |
| Tokyo Factory was relocated to Tsurumi-ku, Yokohama. | 1976 | Completion of ion plating equipment for mass-production
Establishment of carbide film and corrosion-proof film forming technologies |
| 1978 | Completion of continuous liquid crystal injection equipment that contributes to energy conservation Completion of high-speed sputtering equipment (high-frequency type) | |
| 1979 | Completion of continuous electron beam deposition equipment for conductive films | |
| 1982 | Completion of low-pressure plasma CVD equipment Completion of near-infrared firing furnace Completion of direct-connection type oil rotary pumps, SGD-600/1000, and mechanical booster pump, SMB-300 |
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| 1983 | Completion of infrared heating type low-pressure CVD equipment | |
| Head Office and Kobe Factory were relocated to the Seishin Industrial Complex. | 1984 | |
| Completion of the second phase of construction work at the Kobe Factory | 1985 | |
| Kobe Office was relocated to Nishimachi (Mitsui Nissei Kobe Building), Chuo-ku, Kobe. | 1986 | Completion of direct-connection type oil rotary pump, SGD-1300 |
| 1987 | Completion of standardization of double-sided firing furnace for Cu paste Completion of plasma CVD equipment, ACV-660 |
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| 1989 | Completion of c-BN thin film forming equipment Completion of low-noise oil rotary vacuum pump, SR-75BII The multi-purpose ion plating equipment received the Small/Medium Business Excellent New Technology / Product Award (Kyowa Technical Promotion Center). Development of ECR plasma CVD equipment Completion of direct-connection type oil rotary pumps, SGD-400/SGD-900 |
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| 1990 | Completion of pulse plasma CVD equipment |
1991-
| Capital / Business milestones | Technologies / Products milestones | |
|---|---|---|
Capital was increased to 300,000,000 yen. |
1991 | Development of multi-sputtering equipment (PRODUCE) Launch of H2O gas supply unit Completion of erect image precision projector, VS302 |
| 1992 | Launch of two-step ashing equipment |
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| 1993 | Completion of erect image precision projector, VT302 Completion of low-noise oil rotary vacuum pumps, SR-25BII/-37BII |
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| 1994 | Completion of plasma CVD equipment for DLC | |
| 1995 | Development of multi-atmosphere soldering equipment | |
| 1996 | Completion of sealing exhaust equipment for PDP Development of new ashing equipment for mass-production |
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| Shiga Moriyama Factory acquired ISO9001 certification. | 1999 |
Launch of vacuum H2 soldering equipment Launch of plasma cleaning equipment, EXAM Launch of bearing inspection projector, ST |
| Head Office, Kobe Factory, Kobe Office and Tokyo Branch acquired ISO9001 certification. | 2000 | Launch of H2 plasma reflow equipment Launch of large-size SWP ashing equipment Delivery of continuous sealing exhaust equipment for PDP |
| Tokyo branch / transferred to Muromachi Nihonbashi (Nanwa Nihonbashi Bldg.) | 2001 | Completion of plasma etching equipment, EXAM Completion of large-size external heating plasma CVD equipment (Reactor inner diameter: 550 height: 2200) Completion of compact type mechanical booster series, SMB-C06/C15/C25 |
| Head Office, Kobe Factory, Kobe Office and Tokyo Branch acquired ISO9001:2000 certification. | 2002 | Launch of plasma polymerization equipment Completion of c-BN film forming equipment for mass-production tools Development of inline plasma polymerization equipment |
| Shiga Moriyama Factory acquired ISO9001:2000 certification. | 2003 | Development of sealing exhaust equipment for FED Delivery of DLC equipment for mass-production Completion of high-vacuum etching equipment Development of deep ICP equipment for MEMS Delivery of corrosion-proof water-ring vacuum pump (Made of HASTELLOY) Delivery of polarimeter with image processing capabilities, SF-IIC |
| Establishment of division system (Equipment Division and Standard Product Division) Kobe Office was raised to Kobe Branch. |
2004 | Completion of continuous vacuum/H2 soldering equipment Completion of data logging system for film forming equipment Delivery of vacuum soldering equipment achieves 70 units. Completion of deep-focus projector development model Completion of dry pump SSH series |
| Head Office and Kobe Factory acquired ISO14001:1996 certification. | 2005 | |
| Head Office and Kobe Factory acquired ISO14001:2004 certification. Shiga Moriyama Factory acquired ISO14001: 2004 certification. |
2006 | |
| 2007 | Dry vacuum pump received “The Technical award of The Japan Society of Mechanical Engineers Kansai Branch” “Vacuum Solder Equipment for Lead-free Soldering and Flux-free and Void-free Bonding” received the Chairman’s Award in the Product/Technical Development Category at the 1st Hyogo Manufacturing Technology Awards (Hyogo Industrial Association). Also, this equipment received the Award of Excellence in the Product/Technical Development Category at the 2nd Japanese Manufacturing Performance Awards.  |
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| 2008 | Development of virus inspection equipment Launch of polarimeter, SF-IIL |
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| 2009 | Diamond-like-carbon film coating equipment (PIG type DLC film forming equipment) received the 21st Small/Medium Business Excellent New Technology / Product Award (sponsored by RESONA Medium and Small Business Promotion Foundation and Business & Technology Daily News).
Completion of ICP etching equipment (SERIO) |
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| 2010 | Delivery of transparent conductive film mass-production equipment for solar cells | |
| Tokyo Factory was relocated to Kohoku-ku, Yokohama, and renamed the Tokyo Service Center. | 2011 | Completion of large-size dry vacuum pump, SST450 Completion of image processing unit for polarimeter |
| Conclusion of capital/business partnership agreement with Hitachi Zosen Corporation Capital was increased to 375,000,000 yen. |
2012 | |
| 2013 | Launch of dry pump, SSX300 | |
| 2014 | Launch of ultra-high vacuum multi sputtering equipment Launch of multi ICP etching equipment |
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| Shiga Moriyama Factory acquired ISO9001:2015 certification. | 2017 | Launch of SGH Series, Direct-drive Oil Sealed Rotary Vacuum Pump |
| Certification of ISO14001 : 2015 in Moriyama factory Certification of ISO9001 : 2015, ISO14001 : 2015 in Kobe factory |
2018 | |
| Tokyo service center changes its name to Kanto service center, which is transferred to Ayase City, Kanagawa. Our managing director Mashio Tadashi was awarded“The Order of the Rising Sun, Silver Rays”in the 2019 Spring Conferment, gaining recognition of his dedication to the industrial development for many years. |
2019 |
