Batch type sputtering system

These batch type sputtering systems are suitable for R & D and mass-production of various electronic devices and highly functional materials.
This system enables uniform film forming on large surfaces by using a cathode of small diameter. It features advanced software that has been market-tested for high reliability and hardware suitable for various purposes and processes.

  • STH10311
  • SRV4310


This series comes in a proven product lineup that allows users to select the best hardware, software and processes for a wide range of applications from research and development of a single substrate to full-scale mass-production.

Equipment specifications

page top