Atomosphere Plasma System type of SSC-AP series

Atmospheric-pressure plasma systems are broadly divided into “Remote” and “Direct plasma” methods,
Although the majority adopt the remote method, in this approach the distance between the reactor and the substrate
causes the plasma activity to be significantly weakened, resulting in reduced treatment effectiveness.

[Features]
Shinko Seiki has partnered with APP Co., Ltd. and adopted their proprietary direct plasma head “ArP®”,
Discharge the target substrate with high-energy plasma, achieving performance close to CCP processing
even under atmospheric pressure,thereby enabling effective plasma surface treatment.

【Vacuum Plasma:CCP】

■Excellent uniformity performance
■High cleanliness
■By changing the etching gas, it can accommodate a wide range of objectives and applications.
■High initial installation cost and running cost

【Atomosphere　Plasma】

■High throughput
■Low initial installation cost and running cost
■High design flexibility
■Low process gas consumption
■Conventional atmospheric-pressure plasma provides limited surface treatment effectiveness; ArP^® enables to improvement